EVG UV NIL Stepper
This tool, proprietary of EVGroup E, is currently under qualification and evaluation in our clean room.
It has the following specifications:
- Automated step and repeat patterning sequences on 200 silicon wafers
- Thick quartz template with a maximum active surface of 32 × 26 mm2
- Optical alignment with previous photolithography patterning’s
- Imprinting at a reduced pressure environment: from atmospheric down to 25mbar.
