UV Mask aligner

Suss Microtech MJB4 is an UV mask aligner.


It’s used to make lithography with a Chrome/quartz mask on different type of substrate, from a 4 inch silicon wafer to small samples. We work with the 2 different kinds of resists, positive and negative.


The thickness of the resist is between 1µm and 100µm. Delivered power is 37 mW/cm² at 365nm. With this tool, you can obtain 1µm patterns.



Equipments

Fabrication tools

Centre National de la Recherche Scientifique

Université Joseph Fourier

Institut National Polytechnique de Grenoble

commissariat à l'Energie Atomique