Resist characterization
PMMA film thickness impact on Tg
probed by dielectric spectroscopy
In order to decrease the size of the patterns transferred into the lithography resist film it is mandatory to use thinner and thinner resist films. The goal of LTM activities on resist characterization is to check if future lithography resist processes should be optimized to take into account the properties of thin resist films. To succeed in this task, LTM developed a characterisation platform that allows monitoring the thermal properties of thin resist films when exposed or not to UV. It is based on ellipsometry measurements during heating of thin resist films. It is used for exemple to analyse the influence of resist thickness on the glass transition temperature of the polymer. This kinetic mode can be used also to follow the kinetic of reactions taking places in the resist film during its exposure.
